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Multi arc coating equipment

Equipment introduction:

It is a equipment that ignites the evaporation source (cathode) in a vacuum state and forms a self-sustaining arc discharge with the anode, that is, the ions of the cathode material are released from the shining point of the cathode arc. Due to the local concentration of current, the Joule heat generated causes the cathode material to undergo explosive plasma ionization locally. Under the action of workpiece bias, it combines with the reaction gas and deposits on the surface of the workpiece to form a film layer.

1.Chamber sizeφ1000×1200φ1200×1300φ1400×1300φ1600×1300  MaterialSUS304

2.Vacuum chamber structure: vertical front door opening structure, rear pumping system.

3.Vacuum system: mechanical pump+Roots pump+diffusion pump+maintenance pump (or optional molecular pump, plycold, cryogenic system).

4.Circulating water cooling system: double-layer water jacket or water tank cooling system.

5.Process power supply: DC power supply, MF power supply, arc power supply, filament power supply, activation power supply, pulse bias power supply.

6.Multi arc targets: 5 or 18 multi arc targets, 1 or 2 cylindrical arc targets.

7.Twin targets: MF twin cylindrical targets or planar targets (1-4 pairs).

8.Heating system: adjustable and controllable from room temperature to 350 degrees (PID temperature control), with stainless steel heating tubes for heating.

9.Inflation system: Mass flow gauge (1-4 channels).

10.极限真空:6×10-4Pa(空载、净室)。

11.抽气时间:空载大气抽至5×10-3Pa小于13分钟。

12.工件旋转方式 上旋转或下旋转+公自转无极可控调控,0-20/分。

13.控制系统:可编程控制器,触摸屏。